Page "Microelectromechanical systems" Paragraph 14
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Chemical deposition techniques include chemical vapor deposition (" CVD "), in which a stream of source gas reacts on the substrate to grow the material desired.
This can be further divided into categories depending on the details of the technique, for example, LPCVD ( Low Pressure chemical vapor deposition ) and PECVD ( Plasma Enhanced chemical vapor deposition ).
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