Electron beam lithography ( often abbreviated as e-beam lithography ) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film ( called the resist ), (" exposing " the resist ) and of selectively removing either exposed or non-exposed regions of the resist (" developing ").

Electron beam lithography ( often abbreviated as e-beam lithography ) is the practice of emitting a beam of electrons in a patterned fashion across a surface covered with a film ( called the resist ), (" exposing " the resist ) and of selectively removing either exposed or non-exposed regions of the resist (" developing ").

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